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Multi-technique characterisation of MOVPE-grown GaAs on Si

Wong, Chiu Soon and Bennett, N.S. and McNally, P.J. and Galiana, B. and Tejedor, P. and Benedicto, M. and Molina-Aldareguia, J.M. and Monaghan, S. and Hurley, P.K. and Cherkaoui, K. (2010) Multi-technique characterisation of MOVPE-grown GaAs on Si. Microelectronic Engineering, 88 (4). pp. 472-475. ISSN 0167-9317

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Abstract

The heterogeneous integration of III-V materials on a Si CMOS platform offers tremendous prospects for future high speed and low power logic applications. That said this integration generates immense scientific and technological challenges. In this work multi-technique characterisation is used to investigate properties of GaAs layers grown by Metal-Organic Vapour Phase Epitaxy (MOVPE) on Si substrates - (100) with 4⁰ offset towards <110> - under various growth conditions. This being a crucial first step towards the production of III-V template layers with a relatively lower density of defects for selective epitaxial overgrowth of device quality material. The optical and structural properties of heteroepitaxial GaAs are first investigated by micro-Raman spectroscopy and photoluminescence and reflectance measurements. High-resolution X-ray diffraction (HR-XRD) is used to investigate structural properties. Advanced XRD techniques, including double-axis diffraction and X-ray crystallographic mapping are used to evaluate degrees of relaxation and distribution of the grain orientations in the epilayers, respectively. Results obtained from the different methodologies are compared in an attempt to understand growth kinetics of the materials system. The GaAs overlayer grown with annealing at 735⁰C following As predeposition at 500⁰C shows the best crystallinity. Close inspection confirms the growth of epitaxial GaAs preferentially oriented along (100) embedded in a highly-textured polycrystalline structure.

Item Type:Article (Published)
Refereed:Yes
Uncontrolled Keywords:Metal-Organic Vapour Phase Epitaxy
Subjects:Engineering > Electronic engineering
DCU Faculties and Centres:Research Initiatives and Centres > Research Institute for Networks and Communications Engineering (RINCE)
Publisher:Elsevier
Official URL:http://www.sciencedirect.com
Copyright Information:© Elsevier Ltd. 2010
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:15895
Deposited On:10 May 2011 14:35 by Chiu Soon Wong. Last Modified 30 Oct 2012 12:05

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