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Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties

Natarajan, Gomathi and Rajendra Kumar, Ramasamy Thangavelu and Daniels, Stephen and Cameron, David C. and McNally, Patrick J. (2006) Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties. Journal of Applied Physics, 100 (9). ISSN 0021-8979

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We demonstrate that the chemical composition of the sputtered CuCl thin films could be finely controlled by adjusting the bias to the substrate. The films deposited without any intentional bias were Cl rich (CuCl1+x), a bias of −22 V yielded stoichiometric CuCl, and a further increase in the negative bias resulted in Cl deficient films (CuCl1−x). The crystalline and optical properties were found to be associated with the chemical composition. Cl rich films showed a deep level green emission at around 515 nm in addition to ultraviolet (UV) excitonic emission. The stoichiometric films have higher optical quality, exhibiting a sharp UV emission at around 385 nm at room temperature, compared to nonstoichiometric samples. Visible luminescence related to deep level defects was not observed in the stoichiometric films. Changes in energy of the flux from the target and the subsequent ion bombardment on the substrate surface are correlated with the variations in chemical composition and their impact on the film microstructure and UV emission.

Item Type:Article (Published)
Uncontrolled Keywords:quantum-well-structure; zinc-oxide; growth; photoluminescence; silicon; diodes; zno;
Subjects:Physical Sciences > Thin films
Engineering > Electronics
DCU Faculties and Centres:DCU Faculties and Schools > Faculty of Engineering and Computing > School of Electronic Engineering
Research Initiatives and Centres > Research Institute for Networks and Communications Engineering (RINCE)
Research Initiatives and Centres > National Centre for Plasma Science and Technology (NCPST)
DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Publisher:American Institute of Physics
Official URL:
Copyright Information:©2006 American Institute of Physics
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:194
Deposited On:06 Feb 2008 by DORAS Administrator. Last Modified 27 Oct 2016 14:23

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