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Study of morphological and chemical changes of aligned zinc oxide nanorods growth by vapour phase transport on chemical bath deposited buffer layers

Byrne, Daragh and Fath Allah, R. and Ben, T. and Gonzalez Robledo, D. and Twamley, Brendan and Henry, Martin O. and McGlynn, Enda (2011) Study of morphological and chemical changes of aligned zinc oxide nanorods growth by vapour phase transport on chemical bath deposited buffer layers. Crystal Growth & Design, 11 (12). pp. 5378-5386. ISSN 1528-7505

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c-axis aligned ZnO nanorods were deposited by vapour phase transport on textured chemical bath deposited buffer layers. In this work we examine the role of the buffer layer and how it influences the vapour phase transport deposition process using both scanning and scanning transmission electron microscopes and related techniques. Vapour phase transport deposition on chemical bath deposited buffer is a complex growth process with many simultaneously effects including; (i) substantial morphological transformation at high temperature, which influences the base of the nanorods; (ii) the formation of a mixed amorphous / crystalline ZnxSi1-xOy interface during the vapour phase transport growth on silicon substrates; (iii) the overgrowth of the ZnO seed layers, by the silica interface rendering them inactive for nanorod nucleation, suggesting there is a minimum critical thickness ZnO buffer layer necessary for vapour phase transport growth of ZnO nanorods on silicon substrates. We discuss the relative importance of these effects on the overall growth process and use this understanding to explain previous results in the literature.

Item Type:Article (Published)
Subjects:Engineering > Materials
Physical Sciences > Nanotechnology
Physical Sciences > Semiconductors
Physical Sciences > Crystallography
DCU Faculties and Centres:Research Initiatives and Centres > National Centre for Plasma Science and Technology (NCPST)
DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Publisher:American Chemical Society
Official URL:
Copyright Information:© 2011 ACS This document is the Accepted Manuscript version of a Published Work that appeared in final form in Crystal Growth & Design, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:19658
Deposited On:19 Nov 2013 15:11 by Enda McGlynn. Last Modified 20 Jan 2017 11:41

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