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Author: Horan, Ken

Number of items: 3.


Horan, Ken (2012) Investigations of ultra shallow junction ion implanted biaxial tensile strained silicon by means of X-Ray, Raman and photoacoustic techniques. PhD thesis, Dublin City University.


Horan, Ken and Lankinen, Aapo and O'Reilly, Lisa and Bennett, N.S. and McNally, Patrick J. and Sealy, B.J. and Cowern, N.E.B. and Tuomi, T. (2008) Structural and electrical characterisation of ion-implanted strained silicon. Materials Science and Engineering: B, 154-155 . pp. 118-121. ISSN 0921-5107

O'Reilly, Lisa and Horan, Ken and McNally, Patrick J. and Bennett, N.S. and Cowern, N.E.B. and Lankinen, Aapo and Sealy, B.J. and Gwilliam, R.M. and Noakes, T.C.Q. and Bailey, P. (2008) Constraints on micro-Raman strain metrology for highly doped strained Si materials. Applied Physics Letters, 92 (23). ISSN 1077-3118

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