Thin film diffusion barrier formation in PDMS microcavities
Riaz, Asif, Gandhiraman, Ram Prasad, Dimov, Ivan Krastev, Basabe-Desmonts, Lourdes, Ricco, Antonio J.ORCID: 0000-0002-2355-4984, Ducrée, JensORCID: 0000-0002-0366-1897, Daniels, Stephen and Lee, Luke P.
(2009)
Thin film diffusion barrier formation in PDMS microcavities.
In: TRANSDUCERS 2009 - International Solid-State Sensors, Actuators and Microsystems Conference, 21-25 June 2009, Denver, USA.
ISBN 978-1-4244-4193-8
We describe a method to form glass like thin film barrier in polydimethylsiloxane (PDMS) microcavities. The reactive fragments for the surface reaction were created from O2 and hexamethyldisiloxane (HMDS) in RF plasma environment. The reaction is based on migration of the reactive fragments into the microcavities by diffusion, to form a glass like thin film barrier to conceal the naked surface of PDMS. The barrier successfully blocked penetration of a fluorescent dye rhodamine B (RhB) into PDMS. The thickness of the barrier could be controlled by the time of reaction and the pressure inside the reaction chamber. There is a wide range of applications of such a technique in various fields, e.g. for coating the covered surfaces of microfluidic channels, tubes, capillaries, medical devices, catheters, as well as chip-integrated capillary electrophoresis and advanced electronic and opto-fluidic packaging.
TRANSDUCERS 2009 - International Solid-State Sensors, Actuators and Microsystems Conference.
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Institute of Electrical and Electronics Engineers. ISBN 978-1-4244-4193-8