Horan, Ken (2012) Investigations of ultra shallow junction ion implanted biaxial tensile strained silicon by means of X-Ray, Raman and photoacoustic techniques. PhD thesis, Dublin City University.
Horan, Ken, Lankinen, Aapo, O'Reilly, Lisa, Bennett, N.S., McNally, Patrick J. 
ORCID: 0000-0003-2798-5121, Sealy, B.J., Cowern, N.E.B. and Tuomi, Tiinamaija
(2008)
Structural and electrical characterisation of ion-implanted strained silicon.
Materials Science and Engineering: B, 154-15
.
pp. 118-121.
ISSN 0921-5107
O'Reilly, Lisa, Horan, Ken, McNally, Patrick J. ORCID: 0000-0003-2798-5121, Bennett, N.S., Cowern, N.E.B., Lankinen, Aapo, Sealy, B.J., Gwilliam, R.M., Noakes, T.C.Q. and Bailey, P.
(2008)
Constraints on micro-Raman strain metrology for highly doped strained Si materials.
Applied Physics Letters, 92
(23).
ISSN 1077-3118
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