Login (DCU Staff Only)
Login (DCU Staff Only)

DORAS | DCU Research Repository

Explore open access research and scholarly works from DCU

Advanced Search

Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties

Natarajan, Gomathi, Rajendra Kumar, Ramasamy Thangavelu, Daniels, Stephen, Cameron, David C. and McNally, Patrick J. orcid logoORCID: 0000-0003-2798-5121 (2006) Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties. Journal of Applied Physics, 100 (9). ISSN 0021-8979

Abstract
We demonstrate that the chemical composition of the sputtered CuCl thin films could be finely controlled by adjusting the bias to the substrate. The films deposited without any intentional bias were Cl rich (CuCl1+x), a bias of −22 V yielded stoichiometric CuCl, and a further increase in the negative bias resulted in Cl deficient films (CuCl1−x). The crystalline and optical properties were found to be associated with the chemical composition. Cl rich films showed a deep level green emission at around 515 nm in addition to ultraviolet (UV) excitonic emission. The stoichiometric films have higher optical quality, exhibiting a sharp UV emission at around 385 nm at room temperature, compared to nonstoichiometric samples. Visible luminescence related to deep level defects was not observed in the stoichiometric films. Changes in energy of the flux from the target and the subsequent ion bombardment on the substrate surface are correlated with the variations in chemical composition and their impact on the film microstructure and UV emission.
Metadata
Item Type:Article (Published)
Refereed:Yes
Uncontrolled Keywords:quantum-well-structure; zinc-oxide; growth; photoluminescence; silicon; diodes; zno;
Subjects:Physical Sciences > Thin films
Engineering > Electronics
DCU Faculties and Centres:DCU Faculties and Schools > Faculty of Engineering and Computing > School of Electronic Engineering
Research Institutes and Centres > Research Institute for Networks and Communications Engineering (RINCE)
Research Institutes and Centres > National Centre for Plasma Science and Technology (NCPST)
DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Publisher:American Institute of Physics
Official URL:http://dx.doi.org/10.1063/1.2364665
Copyright Information:©2006 American Institute of Physics
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:194
Deposited On:06 Feb 2008 by DORAS Administrator . Last Modified 16 Jan 2019 13:44
Documents

Full text available as:

[thumbnail of jour_app_phy_nov_2006.pdf]
Preview
PDF - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader
78kB
Metrics

Altmetric Badge

Dimensions Badge

Downloads

Downloads

Downloads per month over past year

Archive Staff Only: edit this record