Tanner, Brian K. ORCID: 0000-0002-1474-177X, Vijayaraghavan, Rajani K. ORCID: 0000-0003-1096-448X, Roarty, Billy, Danilewsky, Andreas N. and McNally, Patrick J. ORCID: 0000-0003-2798-5121 (2019) In-operando X-ray diffraction imaging of thermal strains in fully packaged silicon devices. Microelectronics Reliability, 99 . pp. 232-238. ISSN 0026-2714
Abstract
The application of X-ray Diffraction Imaging to measure in operando thermal strains at individually powered components within fully packaged LM3046 silicon devices is described. It is shown that as the local strains increase with power dissipated, above a threshold power loading, the associated region of enhanced X-ray intensity increases monotonically. The changes in contrast in the image are discussed. Asterism in section topographs changes sign as the slit is moved across the component, consistent with lattice strain around the device due to the thermal expansion. Above a threshold power, this asterism increases linearly with power loading. By simultaneous measurement of the package surface temperature it is possible to deduce the local component temperature from the extent of the contrast in the X-ray image.
Metadata
Item Type: | Article (Published) |
---|---|
Refereed: | Yes |
Subjects: | Engineering > Materials Engineering > Microelectronics Physical Sciences > Semiconductors |
DCU Faculties and Centres: | DCU Faculties and Schools > Faculty of Engineering and Computing > School of Electronic Engineering |
Publisher: | Elsevier |
Official URL: | http://dx.doi.org/10.1016/j.microrel.2019.06.006 |
Copyright Information: | © 2019 Elsevier |
Use License: | This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License |
Funders: | Science Foundation Ireland (SFI) under Grant Number 16/RC/3872 which is co-funded under the European Regional Development Fund |
ID Code: | 23516 |
Deposited On: | 03 Jul 2019 11:04 by Patrick Mcnally . Last Modified 20 May 2022 16:36 |
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