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Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge

Sharma, Sarveshwar orcid logoORCID: 0000-0002-0642-0247, Sirse, Nishant orcid logoORCID: 0000-0002-7063-4100, Turner, Miles M. orcid logoORCID: 0000-0001-9713-6198 and Ellingboe, Albert R. orcid logoORCID: 0000-0002-3997-0392 (2018) Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge. Physics of Plasmas, 25 (6). ISSN 2331-8422

One-dimensional particle-in-cell simulation is used to simulate the capacitively coupled argon plasma for a range of driving frequency from 13.56 MHz to 100 MHz. The argon chemistry set can, selectively, include two metastable levels enabling multi-step ionization and metastable pooling. The results show that the plasma density decreases when metastable atoms are included with higher discrepancy at higher excitation frequency. The contribution of multistep ionization to overall density increases with excitation frequency. The electron temperature increases with the inclusion of metastable atoms and decreases with excitation frequency. At lower excitation frequency, the density of Ar** (3p5 4p, 13.1 eV) is higher than Ar* (3p5 4s, 11.6 eV), whereas, at higher excitation frequencies the Ar* (3p5 4s, 11.6 eV) is the dominant metastable atom. The metastable and electron temperature profile evolve from a parabolic profile at lower excitation frequency to a saddle type profile at higher excitation frequency. With metastable, the electron energy distribution function (EEDF) changes its shape from Druyvesteyn type, at low excitation frequency, to bi-Maxwellian, at high frequency plasma excitation, however a three-temperature EEDF is observed without metastable atoms.
Item Type:Article (Published)
Additional Information:Article number: 063501
Subjects:Physical Sciences > Plasmas
DCU Faculties and Centres:DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Research Institutes and Centres > National Centre for Plasma Science and Technology (NCPST)
Publisher:American Institute of Physics
Official URL:https://dx.doi.org/10.1063/1.5031221
Copyright Information:© 2018 AIP Publishing
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
Funders:Korea Institute for the Advancement of Technology and Ministry of Knowledge Economy (No. L-2010-1438-000),, Enterprise Ireland CF 20144043, co-funded by the European Regional Development Fund (EDRF) under the National Strategic Reference Framework (NSRF) 2007-2013
ID Code:27109
Deposited On:09 May 2022 15:44 by Miles Turner . Last Modified 09 May 2022 15:44

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