Li, Yaguo, Zhu, Dexing, Zhang, Qinghua and Brabazon, Dermot ORCID: 0000-0003-3214-6381 (2019) Threshold fluences for conditioning, fatigue and damage effects of DKDP crystals. Optical Materials, 91 . pp. 199-204. ISSN 0925-3467
Abstract
Conditioning, fatigue and damage characteristics on the surface of DKDP nonlinear optical crystals were studied under the
irradiation of 1064 nm (1ω) and 355 nm (3ω) lasers. Conditioning takes effect as laser fluence reaches the lower limit of
conditioning, 6∼8 J/cm2
and 4∼6 J/cm2
for 1064 nm and 355 nm in our experiments, respectively; further increase in laser
fluence will induce fatigue effects when fluence exceeds the “safe” fluence, ∼10 J/cm2
and ∼8 J/cm2
for 1064 nm and
355 nm laser light in the experiments; 1-on-1 damage will take place if fluence is sufficiently high, > 17 J/cm2
(1064 nm)
and 11 J/cm2
(355 nm) in our cases. In the conditioning regime, greater fluence will result in more damage-resistant DKDP
surface and increasing the number of con- ditioning laser pulses will have similar influence on damage resistance of DKDP
surface. When the laser fluence falls into the band of fatigue effects, the laser induced damage threshold (LIDT) drops with
increasing pulse number of conditioning laser incident on DKDP surface and finally stabilizes at a certain value, “safe”
fluence, below which DKDP surface cannot be damaged macroscopically even if a myriad of laser pulses shoot the DKDP
surface. The “safe” fluence is usually 60%∼80% of 1-on-1 LIDT. Our work will be beneficial to optimization of laser
conditioning and to provide insights into laser-induced damage in DKDP crystals.
Metadata
Item Type: | Article (Published) |
---|---|
Refereed: | Yes |
Uncontrolled Keywords: | DKDP; Laser conditioning; Fatigue effect; Fatigue effect; Laser induced damage |
Subjects: | UNSPECIFIED |
DCU Faculties and Centres: | DCU Faculties and Schools > Faculty of Engineering and Computing > School of Mechanical and Manufacturing Engineering Research Institutes and Centres > Advanced Processing Technology Research Centre (APT) |
Publisher: | Elsevier |
Official URL: | https://doi.org/10.1016/j.optmat.2019.03.028 |
Copyright Information: | © 2019 Elsevier |
Funders: | Science Challenge Project (JCKY2016212A506-0503), Foundation for the Development of Science & Technology of China Academy of Engineering Physics(2015B0203032), National Natural Science Foundation of China (51505444), Outstanding Youth Talents Project (2017-JCJQ-ZQ-024), Foundation for Youth Talents of LFRC, CAEP (LFRC-PD012), Funding for Scientific Research Activities of Chinese Returnees |
ID Code: | 29201 |
Deposited On: | 24 Nov 2023 11:25 by Thomas Murtagh . Last Modified 24 Nov 2023 11:25 |
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