Cannon, P., McGlynn, Enda ORCID: 0000-0002-3412-9035, O'Neill, D., O'Connell, B., Freeland, B. and Gaughran, J. (2023) Deposition of ultra-thin SiO2 layers to enable core-shell nanostructure architectures for biosensing applications. In: 18th IEEE Nanotechnology Materials and Devices Conference (NMDC ‘23), October 22nd – 25th 2023, Paestum, Italy.
Abstract
We have developed a facile, low-cost SiO2 physical vapor deposition technique based on the thermal decomposition of polydimethylsiloxane (PDMS) at atmospheric pressure. This technique allows for deposition of ultrathin, conformal, pinhole-free layers of SiO2, using a standard muffle furnace. We demonstrate the coatings’ uniformity and conformality on Si substrates, ZnO thin films, and high aspect ratio ZnO nanorods. We observe a linear relationship between thickness and source material mass (0.25 nanometers SiO2 per milligram of PDMS).
Metadata
Item Type: | Conference or Workshop Item (Lecture) |
---|---|
Event Type: | Conference |
Refereed: | No |
Uncontrolled Keywords: | SiO2, thin film, nanostructure, biosensing |
Subjects: | Engineering > Materials Physical Sciences > Chemistry Physical Sciences > Nanotechnology Physical Sciences > Spectrum analysis Physical Sciences > Thin films |
DCU Faculties and Centres: | DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences Research Institutes and Centres > National Centre for Plasma Science and Technology (NCPST) |
Copyright Information: | - |
Funders: | Irish Research Council under the Government of Ireland Postgraduate Scholarship [grant number: GOIPG/2021/379], Programme for Research in Third Level Institutions (PRTLI) Cycle 5 |
ID Code: | 30338 |
Deposited On: | 01 Oct 2024 13:34 by Enda Mcglynn . Last Modified 02 Oct 2024 10:17 |
Documents
Full text available as:
Preview |
PDF
- Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader
Creative Commons: Attribution-Noncommercial-No Derivative Works 4.0 355kB |
Downloads
Downloads
Downloads per month over past year
Archive Staff Only: edit this record