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Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Snelgrove, Matthew ORCID: 0000-0003-0344-1146, McFeely, Caitlin ORCID: 0000-0002-0447-8250, Mani-González, Pierre Giovanni ORCID: 0000-0001-6993-2349, Lahtonen, K., Lundy, Ross ORCID: 0000-0002-1329-8614, Hughes, Greg ORCID: 0000-0003-1310-8961, Valden, M., McGlynn, Enda ORCID: 0000-0002-3412-9035, Yadav, Pravind ORCID: 0000-0002-7267-9142, Saari, J., Morris, Michael A. ORCID: 0000-0001-8756-4068 and O'Connor, Robert ORCID: 0000-0001-5794-6188 (2020) Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach. Applied Surface Science, 515 . ISSN 0169-4332

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Abstract

Area selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors into patterned polymer materials. The work presented within demonstrates this potential by examining hydroxy terminated poly(2-vinylpyridine) (P2VP-OH) as the 'receiving' polymer and trimethylaluminium (TMA) and H2O as the material precursors in a conventional atomic layer deposition (ALD) process. Fundamental understanding of the surface process was achieved using X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDX) mapping via transmission electron microscopy (TEM). The resulting analysis confirms aluminium inclusion within the polymer film. Spectroscopic and microscopic characterisation show metal infiltration throughout the polymer to the underlying silicon dioxide interface. Exposing the infiltrated film to an oxygen plasma results in the removal of the organic component and resultant fabrication of a sub 5 nm aluminium oxide layer.

Item Type:Article (Published)
Refereed:Yes
Additional Information:Article number 145987
Uncontrolled Keywords:aluminium oxide; atomic layer deposition, ALD; polymer brush; selective infiltration
Subjects:Engineering > Materials
Physical Sciences > Nanotechnology
Physical Sciences > Semiconductors
Physical Sciences > Spectrum analysis
Physical Sciences > Thin films
DCU Faculties and Centres:DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Research Initiatives and Centres > National Centre for Plasma Science and Technology (NCPST)
Research Initiatives and Centres > Advanced Processing Technology Research Centre (APTRC)
Publisher:Elsevier
Official URL:http://dx.doi.org/10.1016/j.apsusc.2020.145987
Copyright Information:© 2020 Elsevier
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:24459
Deposited On:18 May 2020 12:44 by Enda Mcglynn . Last Modified 16 Aug 2022 10:08

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