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Investigation of a differentially powered multi-tile VHF CCP using particle in cell simulation

Bosschaert, Joachim orcid logoORCID: 0000-0002-1060-8285 (2023) Investigation of a differentially powered multi-tile VHF CCP using particle in cell simulation. Master of Science thesis, Dublin City University.

Abstract
A differentially powered, very high frequency (VHF), multi-tile, capacitively coupled plasma system is modelled using particle in cell simulation code, Xoopic [2]. The powered electrode in this system is split into an array of differentially powered tile. The current path is observed in the plasma; one pathway is towards the opposite grounded boundary; a second pathway is observed coupling between adjacent out-of-phase tiles (coupled current). Two physical phenomena are de- scribed that could drive the coupled current; An electrostatic phenomenon, due to a spatio-temporal variation in the plasma potential. And an electromagnetic phenomenon, due to a time-varying magnetic dipole between adjacent tiles that induces an electric field. Through solving Generalized Ohm’s Law in the plasma system, and calculating the magnitude of the induced electric field, it is deter- mined that the electrostatic mechanism is the dominant mechanism for driving the coupled current. A region of higher plasma density is identified in front of the powered electrode. This region also supports a higher electron temperature and ionization rate. Most of the current in this region points from one electrode to the adjacent electrode. Towards the grounded electrode plasma density, electron temperature and ionization rate are lower and most of the current points towards the substrate. As driving current is increases, a larger fraction of driving current moves towards the adjacent tile rather than towards the grounded electrode.
Metadata
Item Type:Thesis (Master of Science)
Date of Award:November 2023
Refereed:No
Supervisor(s):Ellingboe, Albert R.
Subjects:Physical Sciences > Physics
Physical Sciences > Semiconductors
Physical Sciences > Plasma processing
Physical Sciences > Plasmas
DCU Faculties and Centres:DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 License. View License
Funders:Irish Research Council, Irish Center for High-End Computing
ID Code:28968
Deposited On:07 Nov 2023 12:29 by Albert Ellingboe . Last Modified 28 Nov 2023 10:09
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